Design of high-power free-electron laser for EUV lithography applications

Hajima, Ryoichi

no journal, , 

Acceleration of high-brightness and high-power electron beams is becoming a mature technology thanks to development of energy-recovery linacs (ERL). High-power free-electron lasers (FEL) combined with ERLs have been constructed for wavelengths of infrared and recorded over 10-kW average power at Jefferson Laboratory. Since FEL wavelength is tunable by changing the electron energy, it is feasible to obtain a high-power radiation at a wavelength of EUV with a similar system to the IR FELs. In this talk, we present a design of high-power EUV-FELs. The study is based on our up-to-date outcome from the ERL project in Japan, which is a collaborative framework of KEK, JAEA and other laboratories and universities. We present parameter sets for 10-30 kW FELs operated at 13.5 nm with considering technology readiness of critical components such as electron gun and superconducting accelerators. Results of FEL simulations are also presented to discuss the characteristics of EUV light from the FELs.